Industrial anomaly detection and localization are limited by scarce real anomalies and pixel-level annotations, a bottleneck that synthetic image-mask pairs can alleviate. However, existing few-shot mask-guided generation may over-follow mask geometry, produce weak anomalies, or use condition masks incompatible with the current object instance. We propose OSAGEN, which combines object-aware mask priors with multistage decoupled diffusion. Its three-stage adaptation sequentially learns normal appearance, defect appearance under coarse conditions, and fine-grained mask calibration, improving defect realization and local control. QBG injects object structure from a matched normal image into mask diffusion to produce object-aware priors, while ISC restricts anomaly propagation and preserves normal content during sampling. A lightweight materialization step recovers pixel-level labels aligned with the realized defects. On MVTec AD and VisA, OSAGEN achieves AP-P/F1-P scores of 88.1/82.2 and 68.5/66.1, respectively, under a unified downstream localization protocol. The code will be released upon acceptance.

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