We report on the use of time-resolved optical ellipsometry to monitor the deposition of single atomic layers with subatomic sensitivity. Ruddlesden-Popper thin films of SrO(SrTiO3)n=4 were grown by means of metalorganic aerosol deposition in the atomic layer epitaxy mode on SrTiO3(100), LSAT(100) and DyScO3(110) substrates. The measured time dependences of ellipsometric angles, ${\Delta}(t)$ and ${\Psi}(t)$, were described by using a simple optical model, considering the sequence of atomic layers SrO and TiO2 with corresponding bulk refractive indices. As a result, valuable online information on the growth process, the film structure and defects were obtained. Ex situ characterization techniques, i.e. transmission electron microscopy (TEM), X-ray diffraction (XRD) and X- ray reflectometry (XRR) verify the crystal structure and confirm the predictions of optical ellipsometry.

翻译：我们报告了使用时间分辨率光学测光仪监测具有亚原子敏感性的单原子层沉积的情况。SrO(SrtiO3)n=4的液晶薄膜通过原子层外层外层磁性沉降的金属浮质沉积方式在SrtiO3(100)、LSAT(100)和DySO3(110)子质上生长。测量到的日光度角对时间依赖值为$=Delta}(t)和$=Psi}(t),用简单的光学模型描述,其中考虑到原子层SrO和TiO2的序列,并附有相应的成份反折射指数。结果,获得了关于生长过程的宝贵在线信息、电影结构和缺陷。当地特征技术,即传输电子显微镜(TEM)、X射线反射(XRD)和X射线反射测量(XRRR)核查晶体结构,并证实对光光谱测量的预测。