Tomographic Volumetric Additive Manufacturing(TVAM) is a novel manufacturing method that allows for the fast creation of objects of complex geometry in layerless fashion. The process is based on the solidification of photopolymer that occurs when a sufficient threshold dose of light-energy is absorbed. In order to create complex shapes, an illumination plan must be designed to force solidification in some desired areas while leaving other regions liquid. Determining an illumination plan can be considered as an optimisation problem where a variety of objective functionals (penalties) can be used. This work considers a selection of penalty functions and their impact on selected printing metrics; linking the shape of penalty functions to ranges of light-energy dose levels in in-part regions that should be printed and out-of-part regions that should remain liquid. Further, the threshold parameters that are typically used to demarcate minimum light-energy for in-part regions and maximum light-energy for out-of-part regions are investigated systematically as design parameters on both existing and new methods. This enables the characterisation of their effects on some selected printing metrics as well as informed selection for default values. This work is underpinned by a reproducible and extensible framework, TVAM Adaptive Illumination Design(TVAM AID), which makes use of the open-source Core Imaging Library(CIL) that is designed for tomographic imaging with an emphasis on reconstruction. The foundation of TVAM AID which is presented here can hence be easily enhanced by existing functionality in CIL thus lowering the barrier to entry and encouraging use of strategies that already exist for reconstruction optimisation.

翻译：层析体积增材制造是一种新型制造方法，能够以无层方式快速制造复杂几何形状的物体。该工艺基于光聚合物的固化过程，当吸收的光能量达到足够阈值剂量时即发生固化。为制造复杂形状，必须设计照明方案，使特定目标区域发生固化，同时保持其他区域为液态。确定照明方案可视为一个优化问题，其中可采用多种目标函数（惩罚项）。本研究选取了一系列惩罚函数，并分析了其对选定打印指标的影响；将惩罚函数的形状与应打印的部件内部区域和应保持液态的部件外部区域的光能量剂量水平范围联系起来。此外，系统研究了作为设计参数的阈值参数——通常用于界定部件内部区域所需的最小光能量和部件外部区域允许的最大光能量，这些参数在现有方法与新方法中均得到考察。这使得我们能够表征这些参数对选定打印指标的影响，并为默认值的合理选择提供依据。本研究基于一个可复现且可扩展的框架——TVAM自适应照明设计框架，该框架利用专为层析成像设计并侧重重建的开源核心成像库。本文提出的TVAM AID基础框架可借助CIL的现有功能轻松扩展，从而降低使用门槛，并促进现有重建优化策略的推广应用。