Tomographic volumetric additive manufacturing (TVAM) requires projection patterns that achieve high in-part fidelity while suppressing unintended exposure outside the target. We present a scale-invariant projection optimization framework (SiPO) that decouples projection shape from absolute dose scaling. The method formulates projection design as a linear-fractional program based on normalized conformity and spillage metrics, which is converted into a linear program via the Charnes-Cooper transformation. Two practical deterministic cases are introduced for process control: minimizing dose spillage under strict material tolerances and maximizing target conformity under hard inhibition constraints. A matrix-free primal-dual hybrid gradient solver enables large-scale implementation. Numerical results demonstrate that the framework provides a clear trade-off between target fidelity and process separation and remains effective under 3D blur-aware forward models.

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